Results and discussion The precision injection nanomolding proces

Results and discussion The precision injection Tozasertib ic50 nanomolding process has been

widely accepted as one of the rapid replication methods to transfer nanostructures and is considered a major mass production technique for a wide range of commercial products Birinapant [13]. In particular, the major processing parameters can be classified into the following: injection and mold temperatures, packing time and pressure, injection speed, etc. The diameter of the injection nanomolded film is a disk shape which geometric dimension is 120 mm in diameter and 0.6-mm thick. For a typical injection nanomolding operation, the following parameters apply: mold temperature is intentionally controlled in the range of 115 to 130°C, respectively, while the following parameters are fixed: 0.5-s packing time and 130-MPa packing pressure,

injection speed 120 cm/s while the PC viscous flow was maintained at 320°C, total clamping force is fixed at 350 KN. Total cycle time for one shot of process including automatic transfer can be as low as 4 s while maintaining a high-fidelity replication. An automatic monitoring system is included in Selleck GSK1210151A the injection process and deviation for the molding temperature is within ±0.5°C. In previous studies, the molding and PC flow temperature play a significant role on the replicated structure, both in terms of precise fidelity of depth and pitch. Other experimental work can be briefly explained as following: the a stock PC pellets is fed into the system and used as the supply material. The mold holds a temperature controlled water circulation system for the purpose of heating and cooling function that facilitates the continuous operation and to ensure uniformity of viscous flow. The NHA stamp is held in the machine firmly and symmetrically about the mold geometric center while the

transfer mechanism is concurrently applied. Upon finishing the molding process, the molded part is transferred to a conveyer for later rinsing deionized (DI) water bath. The system allows the user to control all the above parameter settings, and in particular, both the material and the molding temperatures are the most crucial ones. Figure 3 shows AFM image of a typical replication of submicron holes with a scan area of 6 × 6 μm2. Submicron holes can be reliably and swiftly replicated for the scanned areas, and typically, we select five to seven measurements for the uniformity consideration. The fidelity of replication is experimentally validated to be extremely good and deviations are routinely maintained with 10% of the fabricated NHA depths. Previous experiences from CD/DVD/BD manufacture assist us in choosing the molding temperature as the dominating factor in the nanoreplication process. In order to investigate the impact of different molding temperatures, temperatures in the range of 110°C to 130°C are selected for the PC film replication process.

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